Octopus – Application test of a simple and effective tool for polishing slurry monitoring

Abstract

In the digital age it has become a fundamental issue to monitor and control process parameters continuously and automatically. The monitoring of critical process parameters enables better quality at lower production costs and higher yields. In order to investigate the interactions between production quality and polishing parameters, we have developed a solution for automatic and reliable measurement of critical parameters. With this paper we first document the resolution and accuracy of the system compared to manual measuring methods currently in use.