Atomic Layer Deposition of Nickel Using a Heteroleptic Ni Precursor with NH3 and Selective Deposition on Defects of Graphene

• Minsu Kim,
• Shunichi Nabeya,
• Dip K. Nandi,
• Kazuharu Suzuki,
• Hyun-Mi Kim,
• Seong-Yong Cho,
• Ki-Bum Kim,
• Soo-Hyun Kim

Affiliations

Minsu Kim

†Department of Materials Science and Engineering, Seoul National University, Seoul, Korea

Shunichi Nabeya

School of Materials Science and Engineering, Yeungnam University, Gyeongsan, Gyeongbuk, Korea

Dip K. Nandi

School of Materials Science and Engineering, Yeungnam University, Gyeongsan, Gyeongbuk, Korea

Kazuharu Suzuki

Tanaka Kikinzoku Kogyo K.K., Tsukuba, Ibaraki, Japan

Hyun-Mi Kim

†Department of Materials Science and Engineering, Seoul National University, Seoul, Korea

Seong-Yong Cho

Department of Materials Science and Engineering, Myongji University, Yongin, Gyeonggi, Korea

Ki-Bum Kim

†Department of Materials Science and Engineering, Seoul National University, Seoul, Korea

Soo-Hyun Kim

School of Materials Science and Engineering, Yeungnam University, Gyeongsan, Gyeongbuk, Korea