Influence of co-sputtering AlB2 to TaB2 on stoichiometry of non-reactively sputtered boride thin films

Abstract

Transition metal diboride thin films are promising functional materials for their outstanding mechanical properties and thermal stability. By combining experiment and simulations, we discuss angular distribution of the sputtered species, their scattering in the gas phase, re-sputtering and potential evaporation from the grown films for the complex evolution of film compositions, as well as energetic preference for vacancy formation and competing phases as factors for governing the phase constitution. By co-sputtering from two compound targets, we developed phase-pure crystalline (Ta,Al)B2 solid solution thin films and correlate the stoichiometry changes with the evolution of their microstructure, hardness, and elastic modulus.

Keywords

• Stoichiometry
• diboride thin films
• hardness
• microstructure
• Ab initio