Micromachines (May 2021)

E/D-Mode GaN Inverter on a 150-mm Si Wafer Based on p-GaN Gate E-Mode HEMT Technology

  • Li-Fang Jia,
  • Lian Zhang,
  • Jin-Ping Xiao,
  • Zhe Cheng,
  • De-Feng Lin,
  • Yu-Jie Ai,
  • Jin-Chao Zhao,
  • Yun Zhang

DOI
https://doi.org/10.3390/mi12060617
Journal volume & issue
Vol. 12, no. 6
p. 617

Abstract

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AlGaN/GaN E/D-mode GaN inverters are successfully fabricated on a 150-mm Si wafer. P-GaN gate technology is applied to be compatible with the commercial E-mode GaN power device technology platform and a systematic study of E/D-mode GaN inverters has been conducted with detail. The key electrical characters have been analyzed from room temperature (RT) to 200 °C. Small variations of the inverters are observed at different temperatures. The logic swing voltage of 2.91 V and 2.89 V are observed at RT and 200 °C at a supply voltage of 3 V. Correspondingly, low/high input noise margins of 0.78 V/1.67 V and 0.68 V/1.72 V are observed at RT and 200 °C. The inverters also demonstrate small rising edge time of the output signal. The results show great potential for GaN smart power integrated circuit (IC) application.

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