Study of silicon strain gauges under electron irradiation

Abstract

The characteristics of semiconductor strain gauges based on boron doped р-type silicon whiskers under high energy electron irradiation were studied. Strain gauges were irradiated at room temperature by electrons with energies 4,2—14 MeV and different doses 5·1016—1·1018 el/cm2. The main parameters of irradiated strain gauges: resistance, its temperature dependence and resistance change vs strain at –196…+100°C and –269…+20°C temperature ranges were measured. There are determined the values of electron irradiation energy and dose at which the radiation stability of strain gauges could be ensured.

Keywords

• silicon strain gauge
• electron irradiation