Light: Advanced Manufacturing (Feb 2023)

A robust phase extraction method for overcoming spectrum overlapping in shearography

  • Xiangwei Liu,
  • Peizheng Yan,
  • Yonghong Wang

DOI
https://doi.org/10.37188/lam.2023.007
Journal volume & issue
Vol. 4, no. 1
pp. 1 – 12

Abstract

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The advantage of spatial phase-shifting shearography is its ability to extract the phase from a single speckle pattern; however, it often faces spectrum overlapping, which seriously affects phase quality. In this paper, we propose a shearography phase-extraction method based on windowed Fourier ridges, which can effectively extract phase information even in the presence of severe spectrum overlapping. A simple and efficient method was applied to determine the parameters of the windowed Fourier ridges, and a linear variation window was used to match the phase-extraction requirements for different frequency coordinates. A numerical simulation was quantitatively conducted to compare the phase-extraction results of the proposed method with those of the conventional method for various cases, and a shearography system was built with two types of objects to demonstrate the feasibility of the proposed method.

Keywords