Fabrication of High Aspect Ratio Nano-Channels by Thermal Nano-Imprinting and Parylene Deposition

Abstract

A low-cost method of fabrication of high aspect ratio nano-channels by thermal nano-imprinting and Parylene deposition is proposed. SU-8 photoresist nano-channels were first manufactured by thermal nano-imprinting, and Parylene deposition was carried out to reduce the width of the nano-channels and increase the aspect ratio. During the process, the side walls of the SU-8 nano-channels were covered with the Parylene film, reducing the width of the nano-channels, and the depth of the channels increased due to the thickness of the Parylene film deposited on the surface of the SU-8 nano-channels, more so than that at the bottom. The influence of Parylene mass on the size of nano-channels was studied by theoretical analysis and experiments, and the deposition pressure of Parylene was optimized. The final high aspect ratio nano-channels are 46 nm in width and 746 nm in depth, of which the aspect ratio is 16. This simple and efficient method paves the way for the production of high aspect ratio nano-channels.

Keywords

• nano-channels
• high aspect ratio
• SU-8 photoresist
• Parylene deposition