Фізика і хімія твердого тіла (Feb 2024)

Structural and morphological properties of CdSe1-xSx thin films obtained by the method of high-frequency magnetron sputtering

  • A.I. Kashuba,
  • I.V. Semkiv,
  • B. Andriyevsky,
  • H.A. Ilchuk,
  • N.T. Pokladok

DOI
https://doi.org/10.15330/pcss.25.1.40-44
Journal volume & issue
Vol. 25, no. 1
pp. 40 – 44

Abstract

Read online

CdSe1-xSx (x= 0.3, 0.4 and 0.6) thin films were deposited on quartz and silicon substrates by the method of high-frequency magnetron sputtering. The chemical composition analysis and crystal structure refinement was examined with using X-ray fluorescence spectroscopy and X-ray diffraction data. CdSe1-xSx thin films crystallizes in hexagonal structure (structure type – ZnO, space group P63mc (No. 186)). The lattice parameters (a, c and V), crystallite size (D), strain (ε), dislocation density (δ) and the texture coefficient TC(hkl) was estimated from X-ray diffraction analysis. Units-cell parameters decrease with increasing S content in CdSe1-xSx thin film.

Keywords