Nature Communications (May 2020)

Prominent radiative contributions from multiply-excited states in laser-produced tin plasma for nanolithography

  • F. Torretti,
  • J. Sheil,
  • R. Schupp,
  • M. M. Basko,
  • M. Bayraktar,
  • R. A. Meijer,
  • S. Witte,
  • W. Ubachs,
  • R. Hoekstra,
  • O. O. Versolato,
  • A. J. Neukirch,
  • J. Colgan

DOI
https://doi.org/10.1038/s41467-020-15678-y
Journal volume & issue
Vol. 11, no. 1
pp. 1 – 8

Abstract

Read online

Extreme ultraviolet (EUV) light is entering use in nanolithography. Here the authors discuss experimental and theoretical results about the prominent role of multiply-excited states in highly charged tin ions in the mechanism of EUV light emission from laser-produced plasma.