AIP Advances (Jun 2017)

Evidence for the bias-driven migration of oxygen vacancies in amorphous non-stoichiometric gallium oxide

  • D. Y. Guo,
  • Y. P. Qian,
  • Y. L. Su,
  • H. Z. Shi,
  • P. G. Li,
  • J. T. Wu,
  • S. L. Wang,
  • C. Cui,
  • W. H. Tang

DOI
https://doi.org/10.1063/1.4990566
Journal volume & issue
Vol. 7, no. 6
pp. 065312 – 065312-6

Abstract

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The conductivity of gallium oxide thin films is strongly dependent on the growth temperature when they deposited by pulsed laser deposition under vacuum environment, exhibiting an insulative-to-metallic transition with the decrease of the temperature. The high conductive gallium oxide films deposited at low temperature are amorphous, non-stoichiometric, and rich in oxygen vacancy. Large changes in electrical resistance are observed in these non-stoichiometric thin films. The wide variety of hysteretic shapes in the I-V curves depend on the voltage-sweep rate, evidencing that the time-dependent redistribution of oxygen vacancy driven by bias is the controlling parameter for the resistance of gallium oxide.