Removal of benzotriazole by Photo-Fenton like process using nano zero-valent iron: response surface methodology with a Box-Behnken design

Abstract

In this paper, the removal of benzotriazole (BTA) was investigated by a Photo-Fenton process using nano zero valent iron (NZVI) and optimization by response surface methodology based on Box-Behnken method. Effect of operating parameters affecting removal efficiency such as H2O2, NZVI, and BTA concentrations as well as pH was studied. All the experiments were performed in the presence of ultraviolet radiation. Predicted levels and BTA removal were found to be in good agreement with the experimental levels (R2 = 0. 9500). The optimal parameters were determined at 60 min reaction time, 15 mg L-1 BTA, 0.10 g L-1 NZVI, and 1.5 mmol L-1 H2O2 for Photo-Fenton-like reaction. NZVI was characterized using X-ray diffraction (XRD), transmission electron microscope (TEM) images, and scanning electron microscope (SEM) analysis.

Keywords

• benzotriazole
• photo-fenton
• response surface methodology
• box-behnken