Nature Communications (Sep 2022)

Chemical deposition of Cu2O films with ultra-low resistivity: correlation with the defect landscape

  • Abderrahime Sekkat,
  • Maciej Oskar Liedke,
  • Viet Huong Nguyen,
  • Maik Butterling,
  • Federico Baiutti,
  • Juan de Dios Sirvent Veru,
  • Matthieu Weber,
  • Laetitia Rapenne,
  • Daniel Bellet,
  • Guy Chichignoud,
  • Anne Kaminski-Cachopo,
  • Eric Hirschmann,
  • Andreas Wagner,
  • David Muñoz-Rojas

DOI
https://doi.org/10.1038/s41467-022-32943-4
Journal volume & issue
Vol. 13, no. 1
pp. 1 – 11

Abstract

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Cu2O offers a lot of potential for several optoelectronic applications. Here, the authors present a low temperature, fast and scalable approach to deposit Cu2O films with low resistivity, which is correlated to the defect landscape in the material.