Deposition of Uniform Nanoscale Patterns on Silicon Dioxide Based on Coaxial Jet Direct Writing

Abstract

To increase the printing stability of low-viscosity solutions, an auxiliary method was proposed using a coaxial electrohydrodynamic jet. A high-viscosity solution was employed as the outer layer in the printing process, and it could be removed (dissolved away) after printing the structures. A combination of mechanical and electrical forces was proposed to enhance the consistency, durability, and alignment of the printed versatile structures. The instability of the jet trajectory (which arose from the repulsion between the jet and the base with a residual charge, in addition to the winding effect of the solution) was also reduced using the drag force along the direction of movement. Moreover, the jet velocity, the surface charge, and the influence of various working voltages on the jet speed were simulated. An array of IDT-BT nanostructures measuring about 100 nm was prepared on silicon dioxide (using an inner needle with a diameter of 130 µm) by equating the moving speed (350 mm/s) of the substrate to the speed of the jet. Moreover, the moving speed (350 mm/s) of the substrate was compared exclusively to the speed of the jet. The method proposed throughout this study can provide a reference for enhancing the stability of low-viscosity solutions on substrates for high-efficiency fabrication devices (NEMS/MEMS).

Keywords

• CE-jet morphology
• phase field model
• drag
• multiphysics
• silicon dioxide
• high-viscosity solution