Systematic research on the performance of self-designed microwave plasma reactor for CVD high quality diamond

Abstract

Optical grade diamond, in particular, high-end products, are mainly used for aerospace and defense purposes. How to manufacture them with higher quality and lower cost was critical technology. Systematic research on the performance of Self-designed plasma reactor with higher power for synthesizing diamond film was carried out. Microwave input power can reach up to 10 kW, the plasma reactor has good adaptability for the deviation of microwave frequency f at 2.45 GHz ± 20 MHz. The secondary plasma could be eliminated by adjusting the working gas pressure and the cylinder adjustment structure, it is helpful to improve the deposition rate with less energy loss. The concentrated and steady plasma could be obtained device with higher gas pressure and relative lower microwave input power. Gas supply modes and inlet gas flow rate were optimized, which would be beneficial to synthesize the film with good quality. Keywords: MPCVD, Plasma reactor, Electric field distribution, Plasma density