Design, optimization and construction of a sputter ion pump

Abstract

Design and construction process of special kind of sputter ion pump is described briefly in this paper. In order to investigate the optimization of effective parameters in choosing and designing ILSF ion pumps, this pump has been designed and manufactured. By optimizing some parameters such as dimension and shape of penning cells, anode voltage, magnetic field and internal structure of pump, it is possible to significantly decrease the cost of construction and operation of synchrotron vacuum system. By using the results of simulations and calculations of electromagnetic field, plasma simulation or glow discharge, titanium sputtering, etc., critical parameters in design of internal structure of ion pump have been optimized. In the following configuration, the pumping has been started at 10-4 torr. The pressure goes down to 10-8, without saturation effect in low pressures  

Keywords

• ion pump
• sputtering yield
• COMSOL simulation
• plasma