Far-Field Super-Resolution Optical Microscopy for Nanostructures in a Reflective Substrate

Abstract

The resolution of an optical microscope is determined by the overall point spread function of the system. When examining structures significantly smaller than the wavelength of light, the contribution of the background or surrounding environment can profoundly affect the point spread function. This research delves into the impact of reflective planar substrate structures on the system’s resolution. We establish a comprehensive forward imaging model for a reflection-type confocal laser scanning optical microscope, incorporating vector field manipulation to image densely packed nanoparticle clusters. Both theoretical and experimental findings indicate that the substrate causes an interference effect between the background field and the scattered field from the nanoparticles, markedly enhancing the overall spatial resolution. The integration of vector field manipulation with an interferometric scattering approach results in superior spatial resolution for imaging isolated particles and densely distributed nanoscale particle clusters even with deep subwavelength gaps as small as 20 nm between them. However, the method still struggles to resolve nanoparticles positioned directly next to each other without any gap, necessitating further work to enhance the resolving ability. This may involve techniques like deconvolution or machine learning-based post-processing methods.

Keywords

• optical microscope
• far-field super-resolution microscopy
• label-free microscopy
• interferometric scattering microscopy
• reflection-type confocal laser scanning microscopy
• vector field manipulation