Application of Plasmon-Induced Lithography for Creation of a Residual-Free Pattern and Simple Surface Modifications

• Roman Elashnikov,
• Jaromír Háša,
• Lukáš Děkanovský,
• Jaroslav Otta,
• Přemysl Fitl,
• Václav Švorčík,
• Oleksiy Lyutakov

Affiliations

Roman Elashnikov

†Department of Solid State Engineering, University of Chemistry and Technology, Prague, Czech Republic

Jaromír Háša

†Department of Solid State Engineering, University of Chemistry and Technology, Prague, Czech Republic

Lukáš Děkanovský

†Department of Solid State Engineering, University of Chemistry and Technology, Prague, Czech Republic

Jaroslav Otta

‡Department of Physics and Measurements, University of Chemistry and Technology, Prague, Czech Republic

Přemysl Fitl

‡Department of Physics and Measurements, University of Chemistry and Technology, Prague, Czech Republic

Václav Švorčík

†Department of Solid State Engineering, University of Chemistry and Technology, Prague, Czech Republic

Oleksiy Lyutakov

†Department of Solid State Engineering, University of Chemistry and Technology, Prague, Czech Republic