Nanoscale mapping of dielectric properties based on surface adhesion force measurements

Abstract

The detection of local dielectric properties is of great importance in a wide variety of scientific studies and applications. Here, we report a novel method for the characterization of local dielectric distributions based on surface adhesion mapping by atomic force microscopy (AFM). The two-dimensional (2D) materials graphene oxide (GO), and partially reduced graphene oxide (RGO), which have similar thicknesses but large differences in their dielectric properties, were studied as model systems. Through direct imaging of the samples with a biased AFM tip in PeakForce Quantitative Nano-Mechanics (PF-QNM) mode, the local dielectric properties of GO and RGO were revealed by mapping their surface adhesion forces. Thus, GO and RGO could be conveniently differentiated. This method provides a simple and general approach for the fast characterization of the local dielectric properties of graphene-based materials and will further facilitate their applications in energy generation and storage devices.

Keywords

• adhesion
• atomic force microscopy (AFM)
• graphene oxide (GO)
• nanoscale dielectric properties
• reduced graphene oxide (RGO)