AIP Advances (Sep 2017)

Ohmic contacts on n-type β-Ga2O3 using AZO/Ti/Au

  • Patrick H. Carey IV,
  • Jiancheng Yang,
  • F. Ren,
  • David C. Hays,
  • S. J. Pearton,
  • Soohwan Jang,
  • Akito Kuramata,
  • Ivan I. Kravchenko

DOI
https://doi.org/10.1063/1.4996172
Journal volume & issue
Vol. 7, no. 9
pp. 095313 – 095313-6

Abstract

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AZO interlayers between n-Ga2O3 and Ti/Au metallization significantly enhance Ohmic contact formation after annealing at ≥ 300°C. Without the presence of the AZO, similar anneals produce only rectifying current-voltage characteristics. Transmission Line Measurements of the Au/Ti/AZO/Ga2O3 stacks showed the specific contact resistance and transfer resistance decreased sharply from as-deposited values with annealing. The minimum contact resistance and specific contact resistance of 0.42 Ω-mm and 2.82 × 10-5 Ω-cm2 were achieved after a relatively low temperature 400°C annealing. The conduction band offset between AZO and Ga2O3 is 0.79 eV and provides a favorable pathway for improved electron transport across this interface.