Gate-tunable metafilm absorber based on indium silicon oxide

Zhao Hongwei; Zhang Ran; Chorsi Hamid T.; Britton Wesley A.; Chen Yuyao; Iyer Prasad P.; Schuller Jon A.; Negro Luca Dal; Klamkin Jonathan

doi:10.1515/nanoph-2019-0190

Nanophotonics (Sep 2019)

Gate-tunable metafilm absorber based on indium silicon oxide

Zhao Hongwei,
Zhang Ran,
Chorsi Hamid T.,
Britton Wesley A.,
Chen Yuyao,
Iyer Prasad P.,
Schuller Jon A.,
Negro Luca Dal,
Klamkin Jonathan

Affiliations

Zhao Hongwei: Electrical and Computer Engineering Department, University of California, Santa Barbara, CA 93106, USA
Zhang Ran: Division of Material Science and Engineering, Boston University, Brookline, MA 02446, USA
Chorsi Hamid T.: Electrical and Computer Engineering Department, University of California, Santa Barbara, CA 93106, USA
Britton Wesley A.: Division of Material Science and Engineering, Boston University, Brookline, MA 02446, USA
Chen Yuyao: Department of Electrical and Computer Engineering and Photonics Center, Boston University, Boston, MA 02215, USA
Iyer Prasad P.: Electrical and Computer Engineering Department, University of California, Santa Barbara, CA 93106, USA
Schuller Jon A.: Electrical and Computer Engineering Department, University of California, Santa Barbara, CA 93106, USA
Negro Luca Dal: Division of Material Science and Engineering, Boston University, Brookline, MA 02446, USA
Klamkin Jonathan: Electrical and Computer Engineering Department, University of California, Santa Barbara, CA 93106, USA

DOI: https://doi.org/10.1515/nanoph-2019-0190
Journal volume & issue: Vol. 8, no. 10
pp. 1803 – 1810

Abstract

Read online

In this work, reconfigurable metafilm absorbers based on indium silicon oxide (ISO) were investigated. The metafilm absorbers consist of nanoscale metallic resonator arrays on metal-insulator-metal (MIM) multilayer structures. The ISO was used as an active tunable layer embedded in the MIM cavities. The tunable metafilm absorbers with ISO were then fabricated and characterized. A maximum change in the reflectance of 57% and up to 620 nm shift in the resonance wavelength were measured.

Published in Nanophotonics

ISSN: 2192-8606 (Print); 2192-8614 (Online)
Publisher: De Gruyter
Country of publisher: Germany
LCC subjects: Science: Physics
Website: https://www.degruyter.com/journal/key/nanoph/html#submit

About the journal

Abstract

Keywords