THERMODYNAMIC ANALYSIS OF THE INTERACTION PROCESS NITROGEN TETRAFLUORIDE AND HEXAFLUOROSILICATES WITH HYDROGEN-CONTAINING AND OXYGENATED SUBSTANCES

Abstract

With thermodynamic calculations using for the system of elements Si-F-H-O it was shown that in practice the SiO2 is the only silicon-containing substance and the HF is the only fluorine-containing substance at the tempera-tures range above 1300 K and the certain ratio of elements. The specified temperature may be achieved by carrying out the interaction of SiF4 with hydrogen-containing and oxygen-containing substances in the combustion mode. This method can become the basis of an industrial technology for HF production.

Keywords

• silicon tetrafluoride
• hydrogen fluoride
• silicon dioxide
• thermodynamic equilibrium
• gibbs energy