Nature Communications (Jul 2018)

Suppression of atom motion and metal deposition in mixed ionic electronic conductors

  • Pengfei Qiu,
  • Matthias T. Agne,
  • Yongying Liu,
  • Yaqin Zhu,
  • Hongyi Chen,
  • Tao Mao,
  • Jiong Yang,
  • Wenqing Zhang,
  • Sossina M. Haile,
  • Wolfgang G. Zeier,
  • Jürgen Janek,
  • Ctirad Uher,
  • Xun Shi,
  • Lidong Chen,
  • G. Jeffrey Snyder

DOI
https://doi.org/10.1038/s41467-018-05248-8
Journal volume & issue
Vol. 9, no. 1
pp. 1 – 8

Abstract

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Mixed ionic–electronic conductors are limited by material decomposition. Here the authors reveal the mechanism for atom migration and deposition in Cu2–δ (S,Se) materials based on a critical chemical potential difference and propose electronically conducting, ion-blocking interfaces to enhance stability.