EPJ Web of Conferences (Jan 2020)

Fabrication and characterization of plasmonic band-stop filter using Ag grating

  • Motogaito Atsushi,
  • Tanaka Ryoga,
  • Hiramatsu Kazumasa

DOI
https://doi.org/10.1051/epjconf/202023805006
Journal volume & issue
Vol. 238
p. 05006

Abstract

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This study proposes a plasmonic band-stop filter with surface plasmon resonance in a doublelayer wire grid structure targeting short-wavelength visible and near-ultraviolet regions for applications in ultraviolet photography. Using Ag and Al, the rigorous coupling wave of analysis method revealed that the maximum absorption was approximately 90% at 450 nm and 375 nm. The experiments using Ag produced similar results in a simulation. These results demonstrate that plasmonic band-stop filters in the visible and near-UV region can be realized at 450 nm and 375 nm using Ag or Al.