Communications Materials (Feb 2023)

Probing the composition dependence of residual stress distribution in tungsten-titanium nanocrystalline thin films

  • Rahulkumar Jagdishbhai Sinojiya,
  • Priya Paulachan,
  • Fereshteh Falah Chamasemani,
  • Rishi Bodlos,
  • René Hammer,
  • Jakub Zálešák,
  • Michael Reisinger,
  • Daniel Scheiber,
  • Jozef Keckes,
  • Lorenz Romaner,
  • Roland Brunner

DOI
https://doi.org/10.1038/s43246-023-00339-6
Journal volume & issue
Vol. 4, no. 1
pp. 1 – 12

Abstract

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Nanocrystalline thin films fabricated by deposition often have high residual stresses, making them susceptible to defects. Here, stress distribution in tungsten-titanium nanocrystalline films are probed by experimental and simulation techniques, revealing the impact of solute concentration on residual stress.