APL Materials
(Aug 2023)
Overcoming the compensation of acceptors in GaN:Mg by defect complex formation
Zijuan Xie,
John Buckeridge,
C. Richard A. Catlow,
Anping Zhang,
Thomas W. Keal,
Paul Sherwood,
You Lu,
Scott M. Woodley,
Alexey A. Sokol
Affiliations
Zijuan Xie
International School of Microelectronics, Dongguan University of Technology, 523808 Dongguan, People’s Republic of China
John Buckeridge
School of Engineering, London South Bank University, SE1 0AA London, United Kingdom
C. Richard A. Catlow
Department of Chemistry, Kathleen Lonsdale Materials Chemistry, University College London, WC1 HOAJ London, United Kingdom
Anping Zhang
International School of Microelectronics, Dongguan University of Technology, 523808 Dongguan, People’s Republic of China
Thomas W. Keal
Scientific Computing Department, STFC Daresbury Laboratory, Daresbury, Warrington WA4 4AD, United Kingdom
Paul Sherwood
Scientific Computing Department, STFC Daresbury Laboratory, Daresbury, Warrington WA4 4AD, United Kingdom
You Lu
Scientific Computing Department, STFC Daresbury Laboratory, Daresbury, Warrington WA4 4AD, United Kingdom
Scott M. Woodley
Department of Chemistry, Kathleen Lonsdale Materials Chemistry, University College London, WC1 HOAJ London, United Kingdom
Alexey A. Sokol
Department of Chemistry, Kathleen Lonsdale Materials Chemistry, University College London, WC1 HOAJ London, United Kingdom
DOI
https://doi.org/10.1063/5.0148858
Journal volume & issue
Vol. 11,
no. 8
pp.
080701
– 080701-9
Abstract
Read online
In GaN:Mg, the MgGa acceptor is compensated extensively by the formation of nitrogen vacancies (VN) and Mg interstitials (Mgi). However, we show that such compensation can be overcome by forming two kinds of Mg-rich complexes: one that contains VN and the other that contains only MgGa and Mgi. Such complexing not only neutralizes VN and Mgi but also forms better complex acceptors that have lower formation energies and smaller hole localization energies than isolated MgGa. Our results help explain the different doping behaviors in samples grown by different methods.
Published in APL Materials
ISSN
2166-532X (Online)
Publisher
AIP Publishing LLC
Country of publisher
United States
LCC subjects
Technology: Chemical technology: Biotechnology
Science: Physics
Website
http://aplmaterials.aip.org
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