Journal of the Serbian Chemical Society (Sep 2006)

Structure and morphology of nano-sized W–Ti/Si thin films

  • BORIVOJE ADNADJEVIC,
  • DAVOR PERUSKO,
  • NADA POPOVIC,
  • NENAD BUNDALESKI,
  • MILAN RADOVIC,
  • BILJANA GAKOVIC,
  • ZLATKO RAKOCEVIC

Journal volume & issue
Vol. 71, no. 8-9
pp. 969 – 976

Abstract

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Thin films were deposited by d.c. sputtering onto a silicon substrate. The influence of the W–Ti thin film thickness to its structural and morphological characteristics of a nano-scale were studied. The phase composition and grain size were studied by X-ray diffraction (XRD), while the surface morphology and surface roughness were determined by scanning tunneling microscopy (STM). The analysis of the phase composition show that the thin films had a polycrystalline structure – they were composed of a b.c.c. Wphase with the presence of a h.c.p. Ti phase. The XRD peak in the scattering angle interval of 38o–43o was interpreted as an overlap of peaks corresponding to the W(110) and Ti(101) planes. The grain size and the mean surface roughness both increase with the thikness of the thin film. The chemical composition of the thin film surface was also analysed by low energy ions scattering (LEIS). The results show the surface segregation of titanium, as well as a substantial presence of oxygen an the surface.

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