Research Progress of Titanium Nitride Thin Films Prepared by Magnetron Sputtering Technology

Abstract

Magnetron sputtering technology has significant advantages in the preparation of TiN films.Technological parameters have an obvious impact on the quality of films.This paper summarized the crystal structure，physical properties of TiN films and the working principle and main classification of magnetron sputtering technology.In addition，the work expounded the laws of influence and mechanism of sputtering power，sputtering time，substrate bias voltage，deposition temperature，sputtering pressure and nitrogen partial pressure on organization structure，surface appearance，deposition rate，surface roughness，preferred orientation，electrical properties，mechanical properties，wear resistance，corrosion resistance，hydrogen evolution properties，etc.Besides，this paper also introduced the situation of research and application of annealing time and annealing temperature on the organization structure and resistivity of films，substrate materials on the deposition rate and surface roughness of films，targets selection on the preparation method and forming process of films.Furthermore，the development trend of magnetron sputtering technology in the preparation of high-quality TiN films was prospected.

Keywords

• tin films|magnetron sputtering|technological parameters|anneal；properties