Materials (Oct 2018)

Recent Progress in Magnetron Sputtering Technology Used on Fabrics

  • Xue-Qiang Tan,
  • Jian-Yong Liu,
  • Jia-Rong Niu,
  • Jia-Yin Liu,
  • Jun-Ying Tian

DOI
https://doi.org/10.3390/ma11101953
Journal volume & issue
Vol. 11, no. 10
p. 1953

Abstract

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The applications of magnetron sputtering technology on the surface coating of fabrics have attracted more and more attention from researchers. Over the past 15 years, researches on magnetron sputtering coated fabrics have been mainly focused on electromagnetic shielding, bacterial resistance, hydrophilic and hydrophobic properties and structural color etc. In this review, recent progress of the technology is discussed in detail, and the common target materials, technologies and functions and characterization of coated fabrics are summarized and analyzed. Finally, the existing problems and future prospects of this developing field are briefly proposed and discussed.

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