The influence of precursor gas pressure on structure and properties of fluoropolymer coatings by hot wire CVD

Abstract

In this paper we investigated the deposition process of the fluoropolymer coatings by the method of Hot Wire Chemical Vapor Deposition. The dependence of precursor gas pressure on deposition rate, structure and properties of the formed film was investigated. The study has shown that the increasing of precursor gas pressure leads to change of the film structure from porous to continuous with globules and further to solid that have different wettability. Depending on the mode of deposition was obtained the fluoropolymer coating with different structure: the wetting angle changed from 60 to 170°. A mechanism of the formation of fluoropolymer coating was discussed.