Improving the Lot Fabrication Stability and Performance of Silica Optical Films during PECVD

Abstract

Silica optical film specifications are determined by their processing capability and their fabrication stability. Here, a statistical process control (SPC) approach usually used in planar lightwave circuits (PLC) is adopted to analyze the stability of the silica optical film fabrication process. Apart from the raw materials, certain key external factors have to be taken into consideration during the PLC process, such as temperature, relative humidity, process variation and machine aging. The fabrication process can be adjusted according to SPC-based results in real-time, so as to produce high quality silica optical film. By using this method, it is possible to assess the effectiveness of older production lines and extend their production capacity at minimal cost.

Keywords

• silica optical waveguide
• planar lightwave circuit
• optical film
• PECVD
• lot fabrication stability