Effect of precursor concentration on stoichiometry and optical properties of spray pyrolyzed nanostructured NiO thin films

Abstract

In this study, spray pyrolysis was used to produce nanostructured NiO thin films from high purity nickel acetate (Ni(CH3COO)2.3H2O) precursors on pre-heated ultrasonically cleaned soda-lime glass substrates. The metallic constituent concentrations in the films were varied, and the precursors were produced in distilled water at various molarities ranging from 0.1 to 0.4 M. In the study, the field-emission scanning electron microscope (FESEM) results strongly confirmed adherence of the films to the glass substrate at 350 °C. The presence of Ni and O in the samples was confirmed using Rutherford backscattering spectroscopy (RBS), X-ray diffractometry (XRD) and energy dispersive X-ray spectroscopy (EDX). For the 0.1 M NiO thin films, the thickness was approximately 43 nm, and for the 0.2 M, 0.3 M, and 0.4 M films, the thickness was 46 nm, 47 nm, and 49 nm, respectively. The XRD findings were supported by the increased Raman intensity peaks with increased precursor concentration, which confirmed the films' improved crystallinity. For the same number of passes of films deposition, as the molar concentration increases, the films thickness increases. The amount of nickel in NiO thin films increases as the molarity increases, but the amount of oxygen in NiO thin films decreases as the molarity increases. It was discovered that as molarity increases, the optical transmittance decreases and the optical band gap narrows. The qualities of NiO discovered in this study suggest the films’ potentials for usage as window layer and buffer material in thin film solar cells.

Keywords

• Thin films
• Precursor
• RBS
• Opto-electronic
• Molarity
• Thickness