Bioscience Journal (Sep 2017)
Reaction of common bean lines derived from recurrent selection for white mold resistance and aggressiveness of Sclerotinia sclerotirum isolates
Abstract
The objectives of this study were to verify the resistance of common bean lines derived from recurrent selection for white mold resistance and to identify those more stable to different isolates; to compare the aggressiveness of different Sclerotinia sclerotiorum isolates; and to verify isolates x lines interaction. Fifteen common bean lines were evaluated, twelve derived from recurrent selection for white mold resistance, one non-adapted source of resistance (Cornell 605), one moderately resistant and adapted (VC-16) and one susceptible to white mold (Corujinha). Ten isolates were used to inoculate the common bean lines through the straw test. A total of ten experiments were performed, one for each isolate. The randomized complete block design with three replications was used in each experiment. Each plot had five plants inoculated in two main branches, therefore the plot data was the average of the ten evaluations through a scale of nine grades. Diallel analysis were used to estimate the general reaction capacity (lines) and general aggressiveness capacity (isolates) to measure the resistance to white mold and the aggressiveness of the isolates, respectively. The GGE biplot analysis was used to group the common bean lines based on their resistance alleles and identify those more instable to the isolates. The resistance of the lines P4 and P10 was similar to Cornell 605, and they had stable reaction to different isolates and "Carioca" grain type. The lines of the advanced cycles of recurrent selection accumulated more favorable alleles than those of the first cycles, confirming the efficiency of the recurrent selection to increase white mold resistance in common bean. In addition, it was identified more aggressive isolates, UFLA 109 and UFLA 116, and a small magnitude of isolates x lines interaction, indicating a predominance of the horizontal resistance of the lines.
