Nanoscale Research Letters (Jun 2020)

Multilevel Resistive Switching Memory Based on a CH3NH3PbI 3−x Cl x Film with Potassium Chloride Additives

  • Fengzhen Lv,
  • Kang Ling,
  • Tingting Zhong,
  • Fuchi Liu,
  • Xiaoguang Liang,
  • Changming Zhu,
  • Jun Liu,
  • Wenjie Kong

DOI
https://doi.org/10.1186/s11671-020-03356-3
Journal volume & issue
Vol. 15, no. 1
pp. 1 – 8

Abstract

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Abstract High-quality CH3NH3PbI 3−x Cl x (MAPIC) films were prepared using potassium chloride (KCl) as an additive on indium tin oxide (ITO)-coated glass substrates using a simple one-step and low-temperature solution reaction. The Au/KCl-MAPIC/ITO/glass devices exhibited obvious multilevel resistive switching behavior, moderate endurance, and good retention performance. Electrical conduction analysis indicated that the resistive switching behavior of the KCl-doped MAPIC films was primarily attributed to the trap-controlled space-charge-limited current conduction that was caused by the iodine vacancies in the films. Moreover, the modulations of the barrier in the Au/KCl-MAPIC interface under bias voltages were thought to be responsible for the resistive switching in the carrier injection trapping/detrapping process.

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