AIP Advances (Mar 2015)
Ultraviolet-visible electroluminescence from metal-oxide-semiconductor devices with CeO2 films on silicon
Abstract
We report on ultraviolet-visible (UV-Vis) electroluminescence (EL) from metal-oxide-semiconductor (MOS) devices with the CeO2 films annealed at low temperatures. At the same injection current, the UV-Vis EL from the MOS device with the 550 °C-annealed CeO2 film is much stronger than that from the counterpart with the 450 °C-annealed CeO2 film. This is due to that the 550 °C-annealed CeO2 film contains more Ce3+ ions and oxygen vacancies. It is tentatively proposed that the recombination of the electrons in multiple oxygen-vacancy–related energy levels with the holes in Ce 4f1 energy band pertaining to Ce3+ ions leads to the UV-Vis EL.