Evaluation of dynamic thiol/disulfide balance and oxidative metabolism in obsessive compulsive disorder patients

Abstract

INTRODUCTION: We aimed to analyze Total Oxidant Status (TOS), Total Antioxidant Status (TAS), Oxidative Stress Index (OSI) are determined in plasma and erythrocyte and thiol/disulfide and malondialdehyde (MDA) levels are determined in the plasma and erythrocyte of OCD patients and healthy controls. METHODS: Our study was conducted with 47 obsessive compulsive disorder patients and 49 healthy controls. All participants completed the sociodemographic data form, clinical global follow-up scale, and Yale Brown obsession-compulsion scale. Total Antioxidant Status (TAS), Total Oxidant Status (TOS) are determined in the plasma and erythrocyte, and malondialdehyde (MDA) and thiol/disulfide levels are determined in plasma. RESULTS: The comparison of the patient and control group plasma TAS, TOS, OSI and MDA levels revealed no statistically significant difference between these parameters. However, erythrocyte TAS was lower in the patient group (p<0.05) and erythrocyte OSI was higher (p<0.05) when compared to healthy controls. While there was no difference between patient and control group plasma total thiol levels, plasma-native thiol levels were significantly higher in the patient group (p<0.001). Plasma disulfide levels were significantly lower in the patient group (p<0.05). DISCUSSION AND CONCLUSION: The analysis of various oxidation marker findings in plasma and erythrocyte revealed that the differences between oxidative stress parameters could have started in the erythrocyte. The elevation in plasma native thiol levels in patients with OCD patients suggested an adaptive mechanism that compensated for the low erythrocyte antioxidant capacity.

Keywords

• obsessive compulsive disorder
• oxidative stress
• thiol
• disulfide
• thiol/disulfide balance.