npj 2D Materials and Applications (Sep 2023)

Unveiling the origin of n-type doping of natural MoS2: carbon

  • Youngsin Park,
  • Nannan Li,
  • Daesung Jung,
  • Laishram Tomba Singh,
  • Jaeyoon Baik,
  • Eunsook Lee,
  • Dongseok Oh,
  • Young Dok Kim,
  • Jin Yong Lee,
  • Jeongseok Woo,
  • Seungmin Park,
  • Hanchul Kim,
  • Geunseop Lee,
  • Geunsik Lee,
  • Chan-Cuk Hwang

DOI
https://doi.org/10.1038/s41699-023-00424-x
Journal volume & issue
Vol. 7, no. 1
pp. 1 – 7

Abstract

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Abstract MoS2 has attracted intense interest in many applications. Natural MoS2 and field-effect transistors made of it generally exhibit n-type characteristics, but its origin is unknown. Herein, we show that C is the origin of the universal n-type doping of natural MoS2. Photoemission spectroscopies reveal that while many MoS2 samples with C detected are n-type, some without C exhibit p-type characteristics. The C-free, p-type MoS2 changes to n-type over time with the concurrent appearance of C that is out-diffused from bulk, indicating that C induces the n-type doping. The C-origin is verified by C-deposition and supported by theoretical calculations. This carbon appears as nanometer-scale defects frequently observed in scanning tunneling microscopy. In addition, we propose, based on the calculations, that S vacancies are responsible for the p-type characteristics, which contrasts with the widespread belief. This work provides new perspectives on MoS2 doping and presents a new direction for fabricating reliable MoS2 devices.