Laser-based defect characterization and removal process for manufacturing fused silica optic with high ultraviolet laser damage threshold

Abstract

Residual processing defects during the contact processing processes greatly reduce the anti-ultraviolet (UV) laser damage performance of fused silica optics, which significantly limited development of high-energy laser systems. In this study, we demonstrate the manufacturing of fused silica optics with a high damage threshold using a CO2 laser process chain. Based on theoretical and experimental studies, the proposed uniform layer-by-layer laser ablation technique can be used to characterize the subsurface mechanical damage in three-dimensional full aperture. Longitudinal ablation resolutions ranging from nanometers to micrometers can be realized; the minimum longitudinal resolution is < 5 nm. This technique can also be used as a crack-free grinding tool to completely remove subsurface mechanical damage, and as a cleaning tool to effectively clean surface/subsurface contamination. Through effective control of defects in the entire chain, the laser-induced damage thresholds of samples fabricated by the CO2 laser process chain were 41% (0% probability) and 65.7% (100% probability) higher than those of samples fabricated using the conventional process chain. This laser-based defect characterization and removal process provides a new tool to guide optimization of the conventional finishing process and represents a new direction for fabrication of highly damage-resistant fused silica optics for high-energy laser applications.

Keywords

• fused silica
• laser materials processing
• defect characterization
• subsurface damage
• process chain