Deuterium retention in tungsten co-deposits with neon and argon inclusions

Abstract

Deuterium (D) retention in tungsten (W) co-deposited layers, in the presence of neon (Ne) and argon (Ar), was investigated using the bipolar High Power Impulse Magnetron Sputtering (BP-HiPIMS) technique. The deposited layers have a polycrystalline structure, with a preferential growth of W(110) phase. The concentration of D and noble gases (Ne and Ar) is almost constant throughout the depth of the layers. In a D2-Ar discharge, the deposited layers exhibit compressive stress, indicating that Ar is mostly incorporated into the interstitial sites of the W crystal lattice. D retention increases when Ne is added in the discharge, especially when the deposited layer is bombarded with highly energetic ions. Low energy Ne ions (below the W damaging threshold) induce compressive stress, indicating that Ne atoms occupy interstitial sites in the W crystal lattice. High energy Ne ions induce tensile stress, a sign that Ne is trapped in the grain boundaries as inert-gas-vacancy defects, leading to a grain-boundary relaxation. In the presence of Ne, the ion acceleration towards the layer from 0 V to 300 V results in an increase of the D content of about three times, from 3.2 at.% to 8.6 at.%.

Keywords

• deuterium retention
• tungsten co-deposition
• neon and argon seeding impurities
• bipolar HiPIMS