Monitoring Surface Stoichiometry, Work Function and Valance Band of Tungsten Oxide (WO<sub>3</sub>), Molybdenum Oxide (MoO<sub>3</sub>) and Tin Oxide (SnO<sub>2</sub>) Thin Films as a Function of Temperature and Oxygen Partial Pressure with Advanced Surface Sensitive Techniques for Chemical Sensing Applications
Engin Ciftyurek,
Martin Wilken,
David Zanders,
Lukas Mai,
Anjana Devi,
Klaus D. Schierbaum
Affiliations
Engin Ciftyurek
Department of Materials Science, Institute for Experimental Condensed Matter Physics, Heinrich Heine University of Duesseldorf, 40225 Düsseldorf, Germany
Martin Wilken
Inorganic Materials Chemistry, Ruhr University Bochum, 44801 Bochum, Germany
David Zanders
Inorganic Materials Chemistry, Ruhr University Bochum, 44801 Bochum, Germany
Lukas Mai
Inorganic Materials Chemistry, Ruhr University Bochum, 44801 Bochum, Germany
Anjana Devi
Inorganic Materials Chemistry, Ruhr University Bochum, 44801 Bochum, Germany
Klaus D. Schierbaum
Department of Materials Science, Institute for Experimental Condensed Matter Physics, Heinrich Heine University of Duesseldorf, 40225 Düsseldorf, Germany
