Monitoring Surface Stoichiometry, Work Function and Valance Band of Tungsten Oxide (WO3), Molybdenum Oxide (MoO3) and Tin Oxide (SnO2) Thin Films as a Function of Temperature and Oxygen Partial Pressure with Advanced Surface Sensitive Techniques for Chemical Sensing Applications

Affiliations

Engin Ciftyurek: Department of Materials Science, Institute for Experimental Condensed Matter Physics, Heinrich Heine University of Duesseldorf, 40225 Düsseldorf, Germany
Martin Wilken: Inorganic Materials Chemistry, Ruhr University Bochum, 44801 Bochum, Germany
David Zanders: Inorganic Materials Chemistry, Ruhr University Bochum, 44801 Bochum, Germany
Lukas Mai: Inorganic Materials Chemistry, Ruhr University Bochum, 44801 Bochum, Germany
Anjana Devi: Inorganic Materials Chemistry, Ruhr University Bochum, 44801 Bochum, Germany
Klaus D. Schierbaum: Department of Materials Science, Institute for Experimental Condensed Matter Physics, Heinrich Heine University of Duesseldorf, 40225 Düsseldorf, Germany

Abstract

Atomic layer deposition (ALD) is a chemical vapor deposition (CVD) deposition method inwhich high-quality [...]