High-Precision Regulation of Nano-Grating Linewidth Based on ALD
Yaxin Zhang,
Chenying Wang,
Weixuan Jing,
Song Wang,
Yujing Zhang,
Liangliang Zhang,
Yijun Zhang,
Nan Zhu,
Yunxiang Wang,
Yifan Zhao,
Qijing Lin,
Zhuangde Jiang
Affiliations
Yaxin Zhang
State Key Laboratory for Manufacturing Systems Engineering, International Joint Laboratory for Micro/Nano Manufacturing and Measurement Technologies, Xi’an Jiaotong University, Xi’an 710049, China
Chenying Wang
State Key Laboratory for Manufacturing Systems Engineering, International Joint Laboratory for Micro/Nano Manufacturing and Measurement Technologies, Xi’an Jiaotong University, Xi’an 710049, China
Weixuan Jing
State Key Laboratory for Manufacturing Systems Engineering, International Joint Laboratory for Micro/Nano Manufacturing and Measurement Technologies, Xi’an Jiaotong University, Xi’an 710049, China
Song Wang
State Key Laboratory for Manufacturing Systems Engineering, International Joint Laboratory for Micro/Nano Manufacturing and Measurement Technologies, Xi’an Jiaotong University, Xi’an 710049, China
Yujing Zhang
State Key Laboratory for Manufacturing Systems Engineering, International Joint Laboratory for Micro/Nano Manufacturing and Measurement Technologies, Xi’an Jiaotong University, Xi’an 710049, China
Liangliang Zhang
State Key Laboratory for Manufacturing Systems Engineering, International Joint Laboratory for Micro/Nano Manufacturing and Measurement Technologies, Xi’an Jiaotong University, Xi’an 710049, China
Yijun Zhang
Electronic Materials Research Laboratory, Key Laboratory of the Ministry of Education & International Center for Dielectric Research, School of Electronic Science and Engineering, Xi’an Jiaotong University, Xi’an 710049, China
Nan Zhu
State Key Laboratory for Manufacturing Systems Engineering, International Joint Laboratory for Micro/Nano Manufacturing and Measurement Technologies, Xi’an Jiaotong University, Xi’an 710049, China
Yunxiang Wang
Suzhou Institute of Metrology, Suzhou 215128, China
Yifan Zhao
State Key Laboratory for Manufacturing Systems Engineering, International Joint Laboratory for Micro/Nano Manufacturing and Measurement Technologies, Xi’an Jiaotong University, Xi’an 710049, China
Qijing Lin
State Key Laboratory for Manufacturing Systems Engineering, International Joint Laboratory for Micro/Nano Manufacturing and Measurement Technologies, Xi’an Jiaotong University, Xi’an 710049, China
Zhuangde Jiang
State Key Laboratory for Manufacturing Systems Engineering, International Joint Laboratory for Micro/Nano Manufacturing and Measurement Technologies, Xi’an Jiaotong University, Xi’an 710049, China
A nano-grating standard with accurate linewidth can not only calibrate the magnification of nano-measurement instruments, but can also enable comparison of linewidths. Unfortunately, it is still a challenging task to control the linewidth of nano-grating standards. Accordingly, in this paper, atomic layer deposition (ALD) was used to regulate the linewidth of the one-dimensional grating standards with a pitch of 1000 nm, fabricated by electron beam lithography (EBL). The standards were measured using an atomic force microscope (AFM) before and after ALD, and the linewidth and pitch of the grating were calculated through the gravity center method. The obtained results prove that the width of a single grating line in the standard can be regulated with great uniformity by precisely utilizing ALD. Meanwhile, the proposed method does not affect the pitch of grating, and the measurement uncertainty of standards is less than 0.16% of the pitch, thereby demonstrating a high surface quality and calibration reliability of the standards, and realizing the integration of linewidth and pitch calibration functions. Moreover, the precise and controllable fabrication method of the micro-nano periodic structure based on ALD technology has many potential applications in the fields of optoelectronic devices and biosensors.
