Tribological Performance of Diamond Films with Different Roughnesses of Silicon Nitride Substrates and Carbon Source Concentrations

Abstract

Diamond films were deposited on silicon nitride (Si3N4) substrates with three different roughnesses using the method of hot-filament chemical vapor deposition (HFCVD). The tribological properties of the film were studied by changing the deposition time, deposition distance, and methane (CH4) concentration. The friction coefficient, delamination threshold load, and wear rate of the diamond films were tested and calculated using the reciprocating friction and wear test under dry friction conditions. The results show that, when the deposition time is 12 h, the bonding force of the film is the lowest and the friction coefficient is the largest (0.175, 0.438, and 0.342); the deposition distance has little effect on the friction performance. The friction coefficients (0.064, 0.107, and 0.093) of nano-diamond films (NCD) prepared at a 40 sccm CH4 concentration are smaller than those of micro-diamond films (MCD) prepared at a 16 sccm CH4 concentration. The load thresholds before delamination of Ra 0.4 μm substrate diamond film are as high as 40 N and 80 N, whereas the diamond films deposited on Ra 0.03 μm substrates have lower wear rates (4.68 × 10−4 mm3/mN, 5.34 × 10−4 mm3/mN) and low friction coefficients (0.119, 0.074, 0.175, and 0.064). Within a certain load range, the deposition of a diamond film on a Ra 0.03 μm Si3N4 substrate significantly reduces the friction coefficient and improves wear resistance. Diamond film can improve the friction performance of a workpiece and prolong its service life.

Keywords

• HFCVD
• diamond films
• Si₃N₄ substrates
• roughness
• carbon source concentrations
• friction and wear