AIP Advances (Feb 2019)

Shear strain-induced anisotropic domain evolution in mixed-phase BiFeO3 epitaxial films

  • Han Xu,
  • Zuhuang Chen,
  • Xiaoyi Zhang,
  • Yongqi Dong,
  • Bin Hong,
  • Jiangtao Zhao,
  • Lang Chen,
  • Sujit Das,
  • Chen Gao,
  • Changgan Zeng,
  • Haidan Wen,
  • Zhenlin Luo

DOI
https://doi.org/10.1063/1.5080709
Journal volume & issue
Vol. 9, no. 2
pp. 025114 – 025114-7

Abstract

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Understanding and controlling the domain evolution under external stimuli in multiferroic thin films is critical to realizing nanoelectronic devices, including for non-volatile memory, data storage, sensors, and optoelectronics. In this article, we studied the shear-strain effect on the domain evolution with temperature in highly strained BiFeO3 thin films on rhombohedral LaAlO3 substrates using a high-resolution synchrotron X-ray diffraction three dimensional-reciprocal space mapping (3D-RSM) technique. The results revealed significant biaxial, anisotropic, evolution behaviors of the mixed-phase (MC + R′/T′ phases) BiFeO3 ferroelectric domains along the in-plane [100] and [010] axes. These biaxial, anisotropic, evolution behaviors were attributed to the shear-strain-modulated transition pathways of the mixed-phase ferroelectric domains. This viewpoint was further verified in the BiFeO3/LaSrAlO4 (001) system in which no anisotropic evolution behaviors of the mixed-phase domains were found. This work sheds light on the quantitative analysis of domain evolution in multi-domain systems and demonstrates that the shear-strain effect could act as an effective tool to manipulate the domain behavior and control novel functionalities of ferroelectric thin films.