Recoverable Patterning of Macro-Assembled Graphene Nanofilms
Xiaoxue Cao,
Jiahao Lin,
Shaoxiong Wu,
Srikrishna Chanakya Bodepudi,
Zongwen Li,
Feng Tian,
Zheng Li,
Xinyu Liu,
Li Peng,
Chao Gao,
Yang Xu
Affiliations
Xiaoxue Cao
School of Micro-Nano Electronics, ZJU-Hangzhou Global Scientific and Technological Innovation Center, State Key Laboratory of Silicon and Advanced Semiconductor Materials, ZJU-UIUC Joint Institute, Zhejiang University, Hangzhou, China
Jiahao Lin
School of Micro-Nano Electronics, ZJU-Hangzhou Global Scientific and Technological Innovation Center, State Key Laboratory of Silicon and Advanced Semiconductor Materials, ZJU-UIUC Joint Institute, Zhejiang University, Hangzhou, China
Shaoxiong Wu
School of Micro-Nano Electronics, ZJU-Hangzhou Global Scientific and Technological Innovation Center, State Key Laboratory of Silicon and Advanced Semiconductor Materials, ZJU-UIUC Joint Institute, Zhejiang University, Hangzhou, China
School of Micro-Nano Electronics, ZJU-Hangzhou Global Scientific and Technological Innovation Center, State Key Laboratory of Silicon and Advanced Semiconductor Materials, ZJU-UIUC Joint Institute, Zhejiang University, Hangzhou, China
Zongwen Li
School of Micro-Nano Electronics, ZJU-Hangzhou Global Scientific and Technological Innovation Center, State Key Laboratory of Silicon and Advanced Semiconductor Materials, ZJU-UIUC Joint Institute, Zhejiang University, Hangzhou, China
Feng Tian
School of Micro-Nano Electronics, ZJU-Hangzhou Global Scientific and Technological Innovation Center, State Key Laboratory of Silicon and Advanced Semiconductor Materials, ZJU-UIUC Joint Institute, Zhejiang University, Hangzhou, China
Zheng Li
School of Micro-Nano Electronics, ZJU-Hangzhou Global Scientific and Technological Innovation Center, State Key Laboratory of Silicon and Advanced Semiconductor Materials, ZJU-UIUC Joint Institute, Zhejiang University, Hangzhou, China
School of Micro-Nano Electronics, ZJU-Hangzhou Global Scientific and Technological Innovation Center, State Key Laboratory of Silicon and Advanced Semiconductor Materials, ZJU-UIUC Joint Institute, Zhejiang University, Hangzhou, China
Li Peng
School of Micro-Nano Electronics, ZJU-Hangzhou Global Scientific and Technological Innovation Center, State Key Laboratory of Silicon and Advanced Semiconductor Materials, ZJU-UIUC Joint Institute, Zhejiang University, Hangzhou, China
Chao Gao
Department of Polymer Science and Engineering, MOE Key Laboratory of Macromolecular Synthesis and Functionalization, International Research Center for X Polymers, Zhejiang University, Hangzhou, China
School of Micro-Nano Electronics, ZJU-Hangzhou Global Scientific and Technological Innovation Center, State Key Laboratory of Silicon and Advanced Semiconductor Materials, ZJU-UIUC Joint Institute, Zhejiang University, Hangzhou, China
Patterning is a crucial fabrication step for successfully applying two-dimensional materials in electronic and optoelectronic devices. It can realize miniaturization and help explore new physical phenomena of 2D materials. However, the manufacturing process inevitably introduces defects, which require harsh conditions to recover. Here, we propose a sputtering-lithography-annealing (SLA) strategy for patterning graphene nanofilm with pattern sizes ranging from microns to 100 nm scale without lattice damage. The sputtered masking agents can introduce easily repairable defects into graphene films. Especially, defects introduced by aluminum can be removed entirely. To confirm the validity of the SLA strategy, we prepared macro-assembled graphene nanofilms (nMAG)/Ge and nMAG/Si heterojunction arrays for infrared detection. The patterned detectors present a responsivity of 0.09 A/W at $2 \mu \text{m}$ (nMAG/Ge) and 26.4 mA/W at 1550 nm (nMAG/Si) with a high array homogeneity, similar to the devices without patterning. This strategy lays the foundation for further exploration of new superstructures of nMAG and can be extended to other 2D materials.
