Transactions on Cryptographic Hardware and Embedded Systems (Sep 2024)

Improved High-Order Masked Generation of Masking Vector and Rejection Sampling in Dilithium

  • Jean-Sébastien Coron,
  • François Gérard,
  • Tancrède Lepoint,
  • Matthias Trannoy,
  • Rina Zeitoun

DOI
https://doi.org/10.46586/tches.v2024.i4.335-354
Journal volume & issue
Vol. 2024, no. 4

Abstract

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for Dilithium, the post-quantum signature scheme recently standardized by NIST. We improve the masked generation of the masking vector y, based on a fast Booleanto- arithmetic conversion modulo q. We also describe an optimized gadget for the high-order masked rejection sampling, with a complexity independent from the size of the modulus q. We prove the security of our gadgets in the classical ISW t-probing model. Finally, we detail our open-source C implementation of these gadgets integrated into a fully masked Dilithium implementation, and provide an efficiency comparison with previous works.

Keywords