Error Model and Frequency Modulation Characteristics Analysis of Laser Processing Platform for Micro Crystal Resonator

Abstract

Laser processing platform for micro crystal resonator (MCR) frequency modulation is an important piece of equipment to apply laser etching technology to the MCR frequency modulation process. The positioning accuracy of the laser processing platform has an important influence on frequency modulation characteristics. In order to improve the precision and efficiency of the laser processing platform for MCR frequency modulation, the error model of the laser processing platform for MCR frequency modulation is established based on the multi-body system theory. According to the Monte Carlo simulation method, the influence of laser processing platform error for MCR on frequency modulation characteristics is analyzed. Considering the requirements of the MCR frequency modulation process, the laser processing platform for MCR frequency modulation is built, and the frequency deviation and frequency modulation performance are verified to meet the engineering requirements.

Keywords

• micro crystal resonator
• laser processing for frequency modulation
• positioning error
• multi-body system theory
• Monte Carlo method