MASK FACE INPAINTING BASED ON IMPROVED GENERATIVE ADVERSARIAL NETWORK

Abstract

Face recognition technology has been widely used in all aspects of people's lives. However, the accuracy of face recognition is greatly reduced due to the obscuring of objects, such as masks and sunglasses. Wearing masks in public has been a crucial approach to preventing illness, especially since the Covid-19 outbreak. This poses challenges to applications such as face recognition. Therefore, the removal of masks via image inpainting has become a hot topic in the field of computer vision. Deep learning-based image inpainting techniques have taken observable results, but the restored images still have problems such as blurring and inconsistency. To address such problems, this paper proposes an improved inpainting model based on generative adversarial network: the model adds attention mechanisms to the sampling module based on pix2pix network; the residual module is improved by adding convolutional branches. The improved inpainting model can not only effectively restore faces obscured by face masks, but also realize the inpainting of randomly obscured images of human faces. To further validate the generality of the inpainting model, tests are conducted on the datasets of CelebA, Paris Street and Place2, and the experimental results show that both SSIM and PSNR have improved significantly.

Keywords

• face inpainting
• generative adversarial network
• residual network
• attention mechanism