STUDY OF THROUGH-THE-THICKNESS NANOPOROUS ALUMINA STRUCTURES WITH IMPLANTED ALUMINUM ELEMENTS

Abstract

Technological features for the formation of 5-100 μm thick implanted aluminum elements and free anodic nanoporous Al2O3 structures simultaneously by a two-sided through electrochemical anodization were studied. It was proved that the thickness of the free alumina plate, the distribution and sizes of the interconnection system in its volume were varied by technological conditions.

Keywords

• aluminum
• electrochemical anodization
• nanoporous alumina
• barrier layer
• two-sided through anodization
• bipolar anodization
• implanted element
• interconnection system