Optical endpoint detection for plasma reduction of graphene oxide

Abstract

The plasma reduction process for the production of reduced graphene oxide (rGO) requires precise process control in order to avoid the degradation of electrical characteristics. We report that the reduction status of the graphene oxides could be determined by monitoring the optical emission intensity at 844.6 nm. Properties of the rGO samples processed with various plasma exposure times were characterized by X-ray photoelectron spectroscopy, Raman spectroscopy, atomic force microscopy, and 4-point probe measurements. Optimum electrical performance and surface morphology were obtained from the sample for which the reduction process was stopped when the emission intensity at 844.6 nm began to decrease.