Sputtering-Deposited Ultra-Thin Ag–Cu Films on Non-Woven Fabrics for Face Masks with Antimicrobial Function and Breath NO_x Response

Abstract

The multifunctional development in the field of face masks and the growing demand for scalable manufacturing have become increasingly prominent. In this study, we utilized high-vacuum magnetron sputtering technology to deposit a 5 nm ultra-thin Ag–Cu film on non-woven fabric and fabricated ultra-thin Ag–Cu film face masks. The antibacterial rates against Escherichia coli and Staphylococcus aureus were 99.996% and 99.978%, respectively, while the antiviral activity against influenza A virus H1N1 was 99.02%. Furthermore, the mask’s ability to monitor respiratory system diseases was achieved through color change (from brownish-yellow to grey-white). The low cost and scalability potential of ultra-thin silver–copper film masks offer new possibilities for practical applications of multifunctional masks.

Keywords

• ultra-thin Ag–Cu film
• antimicrobial fabric
• face masks
• breath NO_x