Nature Communications (Feb 2016)
Suppression of the antiferromagnetic pseudogap in the electron-doped high-temperature superconductor by protect annealing
- M. Horio,
- T. Adachi,
- Y. Mori,
- A. Takahashi,
- T. Yoshida,
- H. Suzuki,
- L. C. C. Ambolode,
- K. Okazaki,
- K. Ono,
- H. Kumigashira,
- H. Anzai,
- M. Arita,
- H. Namatame,
- M. Taniguchi,
- D. Ootsuki,
- K. Sawada,
- M. Takahashi,
- T. Mizokawa,
- Y. Koike,
- A. Fujimori
Affiliations
- M. Horio
- Department of Physics, University of Tokyo
- T. Adachi
- Department of Engineering and Applied Sciences, Sophia University
- Y. Mori
- Department of Applied Physics, Tohoku University
- A. Takahashi
- Department of Applied Physics, Tohoku University
- T. Yoshida
- Department of Physics, University of Tokyo
- H. Suzuki
- Department of Physics, University of Tokyo
- L. C. C. Ambolode
- Department of Physics, University of Tokyo
- K. Okazaki
- Department of Physics, University of Tokyo
- K. Ono
- KEK, Photon Factory
- H. Kumigashira
- KEK, Photon Factory
- H. Anzai
- Hiroshima Synchrotron Radiation Center, Hiroshima University
- M. Arita
- Hiroshima Synchrotron Radiation Center, Hiroshima University
- H. Namatame
- Hiroshima Synchrotron Radiation Center, Hiroshima University
- M. Taniguchi
- Hiroshima Synchrotron Radiation Center, Hiroshima University
- D. Ootsuki
- Department of Physics, University of Tokyo
- K. Sawada
- Graduate School of Frontier Sciences, University of Tokyo
- M. Takahashi
- Department of Physics, University of Tokyo
- T. Mizokawa
- Graduate School of Frontier Sciences, University of Tokyo
- Y. Koike
- Department of Applied Physics, Tohoku University
- A. Fujimori
- Department of Physics, University of Tokyo
- DOI
- https://doi.org/10.1038/ncomms10567
- Journal volume & issue
-
Vol. 7,
no. 1
pp. 1 – 8
Abstract
In cuprates, superconductivity exists in a narrow window at high electron doping concentration with strong antiferromagnetic correlations. Here, the authors demonstrate superconductivity with no effect of antiferromagnetic order in a cuprate for a wide electron doping range following a protect anneal process.
